eprintid: 2216
rev_number: 8
eprint_status: archive
userid: 334
dir: disk0/00/00/22/16
datestamp: 2016-12-31 14:09:17
lastmod: 2016-12-31 14:09:17
status_changed: 2016-12-31 14:09:17
type: article
metadata_visibility: show
creators_name: Kim, Byunggi
creators_name: Iida, Ryoichi
creators_name: Doan, Hong Duc
creators_name: Fushinobu, Kazuyoshi
creators_id: doan.hd.amsl.eng@vnu.edu.vn
title: Mechanism of TCO thin film removal process using near-infrared ns pulse laser: Plasma shielding effect on irradiation direction
ispublished: pub
subjects: Mechanics
subjects: isi
divisions: fac_fema
date: 2016
date_type: published
official_url: http://doi.org/10.1016/j.ijheatmasstransfer.2016.06.009
id_number: doi:10.1016/j.ijheatmasstransfer.2016.06.009
full_text_status: public
publication: International Journal of Heat and Mass Transfer
volume: 102
pagerange: 77-85
refereed: TRUE
issn: 0017-9310
citation:   Kim, Byunggi and Iida, Ryoichi and Doan, Hong Duc and Fushinobu, Kazuyoshi  (2016) Mechanism of TCO thin film removal process using near-infrared ns pulse laser: Plasma shielding effect on irradiation direction.  International Journal of Heat and Mass Transfer, 102 .   pp. 77-85.  ISSN 0017-9310     
document_url: https://eprints.uet.vnu.edu.vn/eprints/id/eprint/2216/1/2016_Mechanism%20of%20TCO%20thin%20film%20removal%20process%20using%20near-infrared%20ns%20pulse%20laser_%20Plasma%20shielding%20effect%20on%20irradiation%20direction.pdf