eprintid: 2624 rev_number: 7 eprint_status: archive userid: 303 dir: disk0/00/00/26/24 datestamp: 2017-11-09 03:21:27 lastmod: 2017-11-09 03:21:27 status_changed: 2017-11-09 03:21:27 type: article metadata_visibility: show creators_name: Do, Hong Minh creators_name: Nguyen, Van Loi creators_name: Nguyen, Huu Duc creators_name: Bui, Nguyen Quoc Trinh creators_id: ducnh@vnu.edu.vn creators_id: trinhbnq@vnu.edu.vn corp_creators: BUI NGUYEN QUOC TRINH title: Low-temperature PZT thin-film ferroelectric memories fabricated on SiO2/Si and glass substrates ispublished: pub subjects: Phys divisions: fac_physic abstract: In a ferroelectric-gate thin film transistor memory (FGT) type structure, the gate-insulator layer is extremely important for inducing the charge when accumulating or depleting. We concentrated on the application of low-temperature PZT films crystallized at 450, 500 and 550 �C, instead of at conventional high temperatures (�600 �C). Investigation of the crystalline structure and electrical properties indicated that the PZT film, crystallized at 500 �C, was suitable for FGT fabrication because of a high (111) orientation, large remnant polarization of 38 mC/cm2 on SiO2/Si substrate and 17.8 mC/cm2 on glass, and low leakage current of 10�6 A/cm2. In sequence, we successfully fabricated FGT with all processes below 500 �C on a glass substrate, whose operation exhibits a memory window of 4 V, ON/OFF current ratio of 105, field-effect mobility of 0.092 cm2 V�1 s�1, and retention time of 1 h. date: 2016-04 date_type: published publisher: Elsevier B.V full_text_status: public publication: Journal of Science: Advanced Materials and Devices volume: 1 pagerange: 75-79 refereed: TRUE issn: 2468-2179 citation: Do, Hong Minh and Nguyen, Van Loi and Nguyen, Huu Duc and Bui, Nguyen Quoc Trinh (2016) Low-temperature PZT thin-film ferroelectric memories fabricated on SiO2/Si and glass substrates. Journal of Science: Advanced Materials and Devices, 1 . pp. 75-79. ISSN 2468-2179 document_url: https://eprints.uet.vnu.edu.vn/eprints/id/eprint/2624/1/15.%20JSAMD-2016%20%28Elsevier%29.pdf