eprintid: 2919
rev_number: 9
eprint_status: archive
userid: 284
dir: disk0/00/00/29/19
datestamp: 2018-02-06 06:43:34
lastmod: 2018-02-06 06:43:34
status_changed: 2018-02-06 06:43:34
type: article
metadata_visibility: show
creators_name: Nguyễn, Cường/ Kiên
creators_name: Tahara, M.
creators_name: Yamauchi,, N.
creators_name: Sone, T.
creators_id: cuongnk@vnu.edu.vn
corp_creators: Technology Research Institute of Osaka Prefecture (TRI), 7-1 Ayumino 2, Izumi, Osaka 594-1157, Japan
title: Effects of nitrogen incorporation on structure of a-C:H films deposited on polycarbonate by plasma CVD
ispublished: pub
subjects: Phys
subjects: isi
abstract: Nitrogen-incorporated-hydrogenated amorphous carbon (a-C:H:N) films were deposited on polycarbonate (PC) substrates by r.f. plasmaenhanced chemical vapor deposition (PECVD). Effects of nitrogen incorporation on microstructure, bonding states, chemical composition,
internal stresses, and friction coefficients of deposited films were investigated. The films were characterized by X-ray photoelectron microscopy, infrared microscopy (IR), Raman spectroscopy and friction tests. Results from the measurement indicate that incorporated nitrogen content has considerable effects on film properties. Raman spectra of the a-C:H:N films are broad, asymmetric and centered at around wavenumber of 1500 cm-1. Shifting of the G-peak toward the higher wavenumber, narrower bandwidth of the G-peak and an increase of the ID/IG ratio demonstrate the graphitic character of the a-C:H:N films with the further increase of the atomic fraction of nitrogen (N/C). IR spectra demonstrate nitrogen bonded to carbon and hydrogen as CZN, CMN, N–H and C–H bonding configurations in the aC:H:N films. The internal stress considerably decreased as well as the friction coefficient is low when the N/C fraction increased. The surface roughness of the a-C:H:N films estimated by atomic force microscopy (AFM) seems to be less smooth with the increase in the N/C fraction.

Keywords: Nitrogen incorporation; a-C:H:N films; Plasma-enhanced chemical vapor deposition (PECVD); Polycarbonate
date: 2005
date_type: published
publisher: Elsevier
official_url: https://www.sciencedirect.com/science/article/pii/S0257897204007935
contact_email: cuongnk@vnu.edu.vn
full_text_status: public
publication: Surface & Coating Technology
volume: 193
pagerange: 283-287
refereed: TRUE
issn: 0257-8972
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funders: Japan Society for the Promotion of Science (JSPS), Japan
citation:   Nguyễn, Cường/ Kiên and Tahara, M. and Yamauchi,, N. and Sone, T.  (2005) Effects of nitrogen incorporation on structure of a-C:H films deposited on polycarbonate by plasma CVD.  Surface & Coating Technology, 193 .   pp. 283-287.  ISSN 0257-8972     
document_url: https://eprints.uet.vnu.edu.vn/eprints/id/eprint/2919/1/Effects%20of%20nitrogen%20incorporation%20on%20structure%20films%20deposited%20on%20polycarbonate%20by%20plasma%20CVD.pdf