<> "The repository administrator has not yet configured an RDF license."^^ . <> . . . "Investigation on solution-processed In-Si-O thin film transistor via spin-coating method"^^ . "In this work, we have explored optimum fabrication condition by a solution processing method for 3 at.% Si doped indium oxide thin-film transistors (TFTs). In-Si-O (ISO) thin films were investigated by X-ray reflectivity (XRR) and X-ray diffraction (XRD) techniques, and the operation of TFTs were characterized by a conventional three-probe method. XRR results suggested that as the annealing temperature increased, the film thickness decreased. In addition, according to XRD measurement, the ISO film started crystalline from 850 °C regardless the film thickness. The best ISO TFT showed the value of VT of –5 V, µ of 1.32 cm2/Vs, SS of 1 V/dec, and on/off current ratio about 107."^^ . "2018" . . . . . . . . . . . . . . . . . . . . . . . . . . . . . "Toshihide"^^ . "Nabatame"^^ . "Toshihide Nabatame"^^ . . "Kazuhito"^^ . "Tsukagoshi"^^ . "Kazuhito Tsukagoshi"^^ . . "Akihiko"^^ . "Fujiwara"^^ . "Akihiko Fujiwara"^^ . . "Tatsuki"^^ . "Hori"^^ . "Tatsuki Hori"^^ . . "Ha"^^ . "Hoang"^^ . "Ha Hoang"^^ . . "Takio"^^ . "Kizu"^^ . "Takio Kizu"^^ . . "To-oru"^^ . "Yasuda"^^ . "To-oru Yasuda"^^ . . "Nguyen Quoc Trinh"^^ . "Bui"^^ . "Nguyen Quoc Trinh Bui"^^ . . . . "The 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)"^^ . . . . . "Kyoto, Japan"^^ . . . . . . "Investigation on solution-processed In-Si-O thin film transistor via spin-coating method (PDF)"^^ . . . "Manuscript_FPD2018.pdf"^^ . . "HTML Summary of #3001 \n\nInvestigation on solution-processed In-Si-O thin film transistor via spin-coating method\n\n" . "text/html" . . . "Engineering Physics" . .