<> "The repository administrator has not yet configured an RDF license."^^ . <> . . . "Si-doping effect on solution-processed In-O thin-film transistors"^^ . "In this work, silicon-doped indium oxide thin-film transistors (TFTs) have been fabricated for the first\r\ntime by a solution processing method. By varying the Si concentration in the In2O3–SiO2 binary oxide\r\nstructure up to 15 at%, the thicknesses, densities, and crystallinity of the resulting In–Si–O(ISO) thin\r\nfilms were investigated by x-ray reflectivity (XRR) and x-ray diffraction techniques, while the\r\nproduced TFTs were characterized by a conventional three-probe method. The results of XRR analysis\r\nrevealed that the increase in the content of Si dopant increased the thickness of the produced film and\r\nreduced its density, and that all the Si-doped ISO thin films contained only a single amorphous phase\r\neven after annealing at temperatures as high as 800 °C. The manufactured ISO TFTs exhibited a\r\nreduction in the absolute value of threshold voltage VT close to 0 Vand low current in the off-state, as\r\ncompared to those of the non-doped indium oxide films, due to the reduced number of oxygen\r\ndefects, which was consistent with the behavior of ISO TFTs fabricated by a sputtering method. The\r\nISO TFT with a Si content of 3 at% annealed at 400 °Cdemonstrated the smallest subthreshold swing\r\nof 0.5 V/dec, VT of−5 V, mobility of 0.21 cm2 V−1s−1, and on/off current ratio of about 2×107."^^ . "2018-11-14" . . "6" . . "IOP publishing"^^ . . . "Materials Research Express"^^ . . . "20531591" . . . . . . . . . . . . . . . . . . . . . . . . . . . . "Ha"^^ . "Hoang"^^ . "Ha Hoang"^^ . . "Takio"^^ . "Kizu"^^ . "Takio Kizu"^^ . . "Tatsuki"^^ . "Hori"^^ . "Tatsuki Hori"^^ . . "Nguyen Quoc Trinh"^^ . "Bui"^^ . "Nguyen Quoc Trinh Bui"^^ . . "Toshihide"^^ . "Nabatame"^^ . "Toshihide Nabatame"^^ . . "Kazuhito"^^ . "Tsukagoshi"^^ . "Kazuhito Tsukagoshi"^^ . . "To-oru"^^ . "Yasuda"^^ . "To-oru Yasuda"^^ . . "Akihiko"^^ . "Fujiwara"^^ . "Akihiko Fujiwara"^^ . . . . . . "Si-doping effect on solution-processed In-O thin-film transistors (PDF)"^^ . . . "(published) MRX6-026410.pdf"^^ . . "HTML Summary of #3164 \n\nSi-doping effect on solution-processed In-O thin-film transistors\n\n" . "text/html" . . . "Engineering Physics" . . . "ISI-indexed journals"@en . .