Nagahara, K. and Bui, Nguyen Quoc Trinh and Tokumitsu, E. and Inoue, S. and Shimoda, T. (2014) 120 nm Channel Length Ferroelectric Gate Thin-Film Transistor by Nano-imprinting Lithography. Japanese Journal of Applied Physics, 2014, 53 . 02BC14-1. ISSN 0021-4922
Full text not available from this repository.| Item Type: | Article |
|---|---|
| Subjects: | Engineering Physics |
| Divisions: | Faculty of Engineering Physics and Nanotechnology (FEPN) |
| Depositing User: | Ms. Cam Le Tran Thi |
| Date Deposited: | 12 Aug 2015 03:40 |
| Last Modified: | 14 Aug 2015 07:50 |
| URI: | http://eprints.uet.vnu.edu.vn/eprints/id/eprint/1284 |
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